Semiconductors

In situ thin film evaluation

In-chamber wafer analysis by incorporating analytical parts into the chamber

By irradiating light from outside the chamber and detecting the reflected light from the sample outside the chamber, thin films can be evaluated without exposing the sample to the atmosphere.

Spectroscopic Ellipsometer UVISEL Plus

Evaluation of optical constants for film thickness on the order of Å
The phase modulation method and temperature control function, which do not involve mechanical movement, suppress the effects of vibrations and enable reliable evaluation with a high signal-to-noise ratio.
Film thickness evaluation up to 85 μm (depending on film condition)
High wavelength resolution and unique optical system enable film thickness evaluation over a wide range.

UVISEL PLUS椭圆偏振光谱仪

研究级经典型椭偏仪

» Link to Spectroscopic Ellipsometry

留言咨询

如您有任何疑问，请在此留下详细需求信息，我们将竭诚为您服务。

姓

名 *

公司院校 *

邮编 *

城市

国家/地区 *

省份

E-Mail *

电话

HORIBA部门

您的详细需求 *

我已阅读并同意HORIBA的隐私政策

* 这些字段为必填项。