Semiconductors

Particle zeta potential analysis in CMP slurry

Charge state analysis of slurry particles using a small sample (100 μL or more)

It is important to analyze the components remaining on the wafer surface during the cleaning process after the CMP process. Zeta potential is one of the indicators for this evaluation.

Nanoparticle analyzer nanoPartica SZ-100V2

3 functions in 1: Measurement of particle size, zeta potential, and molecular weight
Compatible with particle diameters from 0.3 nm to 10 μm and zeta potential from -500 to +500 mV
Particle size distribution under high concentration conditions can be measured using a high concentration cell.