CMP slurry dispersibility analysis

For quality control of CMP slurry, we were able to quickly distinguish between OK products with a size of 100 nm or less and coarse particles (NG products) with a size of around a few μm.

• CMP slurry particle size analysis
  • Slurry particle size analysis of tens of nm using centrifugal sedimentation method
• CMP slurry dispersibility analysis
  • Particle dispersion analysis in slurry stock solution
• Particle zeta potential analysis in CMP slurry
  • Impurity analysis in GaAs wafers by cathodoluminescence
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