Thin Film characterization are important in the development phase of new materials to minimize the time to market of a new generation of devices and in the metrology step, which is required for improving the yield of a production line for minimizing wafer-to-wafer variation. HORIBA a leader in optical spectroscopy from deep UV to XRF offers a unique range of high-end tools for Materials and Thin Film Analysis which can used in R&D, In-Line or integrated in a process chamber.
Key Benefits:
Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm
In-situ spectroscopic ellipsometer for real-time thin film monitoring
Spectroscopic Ellipsometer for Simple Thin Film Measurement
AFM-Raman for Physical and Chemical imaging
AFM-Raman for physical and chemical imaging
Camera Endpoint Monitor based on Real Time Laser Interferometry
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