Research and Testing Laboratories

Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.

RF GD OES is well known for ultra fast elemental depth profile of thin and thick films. All elements can be measured including Hydrogen (H) which is important in many application fields - for corrosion studies, for PV, in metallurgy, for the development of hydrogen storage materials and for all polymeric coatings studies to name a few. The most sensitive emission line for H is in the VUV range at 121,567 nm.