Semiconductors

Film thickness and film quality analysis of ultra-thin films

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SiO2 film analysis of Å order thin film using spectroscopic ellipsometer

Treatments are sometimes applied to improve the film quality of ultra-thin SiO₂ films deposited on Si substrates, and the UVISEL Plus can identify slight differences in film thickness and film quality before and after the treatment.

Through the treatment, a change in film thickness of several Å and a slight change in refractive index was confirmed . As a result of this treatment, the film thickness decreased, and an increase in refractive index suggests that the film became denser.

Spectroscopic Ellipsometer UVISEL Plus

  • Evaluation of optical constants for film thickness on the order of Å
    The phase modulation method and temperature control function, which do not involve mechanical movement, suppress the effects of vibrations and enable reliable evaluation with a high signal-to-noise ratio.
  • Film thickness evaluation up to 85 μm (depending on film condition)
    High wavelength resolution and unique optical system enable film thickness evaluation over a wide range.
UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

» Link to Spectroscopic Ellipsometry

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