LE Series

Large Flow Liquid Source Vaporization Control System LE Series Image

大流量液源汽化控制系統

高流量、高效率的液體蒸發器,其流道和加熱器元件嵌入鑄鋁塊中,可確保最大程度的傳熱,並消除冷凝的風險。此液體源蒸發控制系統可在高達 300 °C 的溫度下運行,並且可蒸發高達 30 克/分鐘的 IPA(或同等物質)。

事業部: Semiconductor
產品分類: Fluid Control
製造商: HORIBA STEC, Co., Ltd.
  • Innovative design maximizes vaporization rate
  • New injector nozzle ensures consistent liquid injection which contributes to stable vapor output concentration
  • All stainless steel, fully swept flow path for maximum corrosion resistance and minimum particulate generation
  • Compatible with many types of precursors materials.
Application liquidH2O/IPA/TEOS/SiCl4

Please contact HORIBA if you require vaporizing any liquid materials that are not listed here.
Maximum vaporization volume (gas flow rate)H2O : 10g/min (12.4 SLM)
IPA : 30g/min (11.1 SLM)
TEOS : 50g/min(5.3 SLM)
SiCl4 : 130g/min(17.1 SLM)
Liquid Source Vaporization and Supply in Research and Testing Laboratories
Liquid Source Vaporization and Supply in Research and Testing Laboratories
Sterilization Process in Food and Beverage Manufacturing
Sterilization Process in Food and Beverage Manufacturing
Optical Fiber Manufacturing Process in Electrical Equipment
Optical Fiber Manufacturing Process in Electrical Equipment

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